TFE4180

Semiconductor Manufacturing Technology

Last taught 2016

Spring

Norwegian

Overview

42 candidates

Average grade

B

3.69

0.53

Pass rate

100%

14 points

Grade distribution
Average over time
Pass rate over time

About this course

Content

Processing of semiconductor devices and CMOS integrated circuits, including film deposition, ion implant, photolithography, etch, metallization, assembly and packaging. In addition, epitaxial growth of semiconductors. Compound semiconductor heterostructures and superlattices. The assessment of semiconductors by electrical techniques (resistivity, mobility, doping levels), by ion beam techniques (SIMS), and by microscopy and imaging (optical, SEM, TEM, STM, AFM).

Learning outcomes

Introduction to semiconductor thin film technology for fabrication of electronic and photonic devices and CMOS integrated circuits.

A. Knowledge:
This course shall provide the theoretical basis for doing photolithography and processing of semiconductor devices and CMOS integrated circuits, as well as the theoretical basis for selected characterization techniques.

B. Skills:
Be able to do photolithography and simple processing of semiconductors in clean room, and to do characterization with selected techniques. Be able to present and discuss the theoretical basis for processing and characterization.

Teaching methods

Lectures, excercises, presentations by the students, laboratory demonstrations, and laboratory excercises in clean room. If there is a re-sit examination, the examination form may be changed from written to oral.